Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Variable mode plasma chamber utilizing tunable plasma potential

Variable mode plasma chamber utilizing tunable plasma potential

US Patent 11189464 · Granted Nov 30, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pulsing control match network and generator2025
Apparatus and method for measuring pedestal voltage uniformity in plasma process2025
Enhanced ignition in inductively coupled plasmas for workpiece processing2025
Enhanced ignition in inductively coupled plasmas for workpiece processing2025
Inductive broad-band sensors for electromagnetic waves2025
Atomic layer etch process using plasma in conjunction with a rapid thermal activ2024
Arc lamp with forming gas for thermal processing systems2024
Plasma non-uniformity detection2024
Variable mode plasma chamber utilizing tunable plasma potential2024
Variable mode plasma chamber utilizing tunable plasma potential2024
Sector shunts for plasma-based wafer processing systems2024
Enhanced ignition in inductively coupled plasmas for workpiece processing2023