Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Substitute sample, method for determining control parameter of processing, and measurement system

Substitute sample, method for determining control parameter of processing, and measurement system

US Patent 11152237 · Granted Oct 19, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Processing condition search device and processing condition search method2025
Processing condition search device and processing condition search method2025
Experiment point recommendation device, experiment point recommendation method, 2025
Charged particle beam device, and sample observation method employing same2025
Plasma processing method and plasma processing apparatus2025
Computer system, dimension measurement method, and storage medium2025
Dimension measurement apparatus, semiconductor manufacturing apparatus, and semi2025
Process recipe search apparatus, etching recipe search method and semiconductor 2025
Plasma processing apparatus and plasma processing method2024
Contour analysis apparatus, processing condition determination system, shape est2024
Contour analysis apparatus, processing condition determination system, shape est2024
Wafer processing method and plasma processing apparatus2024