Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound

Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound

US Patent 11126084 · Granted Sep 21, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Chemical structure generating device, chemical structure generating program, and2025
Composition, resist underlayer film, method of forming resist underlayer film, m2025
Composition, pattern-forming method, and compound-producing method2024
Composition, film, film-forming method and patterned substrate-producing method2023
Composition, film, film-forming method and patterned substrate-producing method2023
Composition for resist underlayer film formation, resist underlayer film and for2022
Composition for resist underlayer film formation, resist underlayer film and for2022
Composition for resist underlayer film formation, resist underlayer film and met2022
Composition for resist underlayer film formation, resist underlayer film and met2022
Composition for resist underlayer film formation, resist underlayer film and met2022
Composition for resist underlayer film formation, resist underlayer film and met2022
Composition for resist underlayer film formation, resist underlayer film and met2022