Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Polishing process for forming semiconductor device structure

Polishing process for forming semiconductor device structure

US Patent 11094554 · Granted Aug 17, 2021

Estimated economic value: $12,898,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Vacuum assembly for chemical mechanical polishing2025
Vacuum assembly for chemical mechanical polishing2025
CMP safe alignment mark2025
Magnetic tunnel junction device and method of forming same2024
Chemical mechanical polishing apparatus and method2024
Chemical mechanical polishing apparatus and method2024
Chemical mechanical polishing apparatus and method2024
Method for forming semiconductor device structure2024
Method for forming semiconductor device structure2024
Magnetic tunnel junction device and method of forming same2024
Method and system for performing chemical mechanical polishing2023
Method and system for performing chemical mechanical polishing2023