Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Extreme ultraviolet lithography system, device, and method for printing low pattern density features

Extreme ultraviolet lithography system, device, and method for printing low pattern density features

US Patent 10976655 · Granted Apr 13, 2021

Estimated economic value: $14,551,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photo-detecting apparatus with low dark current2025
Optical sensing apparatus2025
Lithography method with reduced impacts of mask defects2025
Lithography method with reduced impacts of mask defects2025
Geometric mask rule check with favorable and unfavorable zones2025
Power-off protection method and apparatus, device, and storage medium2025
Photo-detecting apparatus with low dark current2025
Optical sensing apparatus2025
Method of manufacturing a semiconductor device and apparatus for manufacturing t2025
Photodetecting device for detecting different wavelengths2025
Geometric mask rule check with favorable and unfavorable zones2024
Light-sensing apparatus and light-sensing method thereof2024