Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › In-situ deposition and etch process and apparatus for precision patterning of semiconductor devices

In-situ deposition and etch process and apparatus for precision patterning of semiconductor devices

US Patent 10847376 · Granted Nov 24, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Negative electrode active material, negative electrode and method for producing 2025
Fastening tool2025
Fastening tool2025
Fastening tool2025
Fastening tool2025
Fastening tool2025
Negative electrode active material and method for producing the same2024
Fastening tool2024
Negative electrode active material for non-aqueous electrolyte secondary battery2024
Negative electrode active material, mixed negative electrode active material, aq2024
Three-dimensional memory device containing self-aligned bit line contacts and me2024
Three-dimensional memory device containing self-aligned bit line contacts and me2024