Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Epitaxial film forming method, sputtering apparatus, manufacturing method of semiconductor light-emitting element, semiconductor light-emitting element, and illumination device

Epitaxial film forming method, sputtering apparatus, manufacturing method of semiconductor light-emitting element, semiconductor light-emitting element, and illumination device

US Patent 10844470 · Granted Nov 24, 2020

Estimated economic value: $27,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Film deposition method2025
Rectifying plate, fluid-introducing apparatus, and film-forming apparatus2024
Susceptor cover2024
Susceptor ring2024
Vapor phase growth apparatus and vapor phase growth method2023
Vapor phase growth method2022
Vapor phase growth apparatus and vapor phase growth method2022
Group III nitride composite substrate and method for manufacturing the same, and2021
Film formation method, vacuum processing apparatus, method of manufacturing semi2021
Group III nitride composite substrate and method for manufacturing the same, and2020
Film forming apparatus and film forming method2019
Film forming method, method of manufacturing semiconductor light-emitting device2019