Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Compositions and methods for etching silicon nitride-containing substrates

Compositions and methods for etching silicon nitride-containing substrates

US Patent 10651045 · Granted May 12, 2020

Estimated economic value: $26,489,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Steel-concrete composite web and construction method thereof2025
Formulations to selectively etch silicon-germanium relative to silicon2025
Selective removal of metal oxide hard masks2025
Nitride etchant composition and method2024
Selective etchant compositions and methods2024
Selective etchant compositions and methods2024
Compositions and methods for selectively etching silicon nitride films2024
Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tun2024
Organic compound, organic electroluminescent device and electronic apparatus inc2024
Formulations to selectively etch silicon-germanium relative to silicon2024
Nitrogen-containing compound, and organic electroluminescent device and electron2023
Organic compound with spirocyclic adamantane, and electronic element and electro2023