Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Systems, methods, and apparatuses for implementing a high mobility low contact resistance semiconducting oxide in metal contact vias for thin film transistors

Systems, methods, and apparatuses for implementing a high mobility low contact resistance semiconducting oxide in metal contact vias for thin film transistors

US Patent 10644123 · Granted May 5, 2020

Estimated economic value: $29,615,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Nanowire transistor fabrication with hardmask layers2025
Dielectric sidewall features for tuning thin film transistor (TFT) parasitics2025
Asynchronous carry-ripple adder with majority or minority gates2025
Punch-through interconnect feature to couple upper electrodes of capacitors of m2025
Conductive contacts wrapped around epitaxial source or drain regions2025
Ripple carry adder with ferroelectric or paraelectric wide-input minority or maj2025
Diode connected non-linear input capacitors based majority gate2025
Non-linear polar material based low power multiplier with transmission-gate base2025
Gate coupled non-linear polar material based capacitors for memory and logic2025
Gate-all-around integrated circuit structures having germanium-diffused nanoribb2025
Co-deposition of titanium and silicon for improved silicon germanium source and 2025
Compositional engineering of Schottky diode2025