Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Temperature-controlled flange and reactor system including same

Temperature-controlled flange and reactor system including same

US Patent 10612136 · Granted Apr 7, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Susceptor improvement2025
Epitaxial methods including a haloborane formula for growing boron-containing st2025
Flow guide structures and heat shield structures, and related methods, for depos2025
Wafer far edge temperature measurement system with lamp bank alignment2025
Method for depositing boron and gallium containing silicon germanium layers2025
Method for depositing boron and gallium containing silicon germanium layers2025
Susceptors with film deposition control features2025
Method for depositing a Group IV semiconductor and related semiconductor device 2025
Method for depositing a Group IV semiconductor and related semiconductor device 2025
Monolithic complementary field-effect transistors having carbon-doped release la2025
Method for cleaning quartz epitaxial chambers2025
Susceptor2025