Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Metrology method, apparatus and computer program

Metrology method, apparatus and computer program

US Patent 10598483 · Granted Mar 24, 2020

Estimated economic value: $14,045,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate comprising a target arrangement, and associated at least one patternin2025
Method for filtering an image and associated metrology apparatus2025
Metrology system and method for determining a characteristic of one or more stru2025
Substrate comprising a target arrangement, and associated at least one patternin2025
Voltage contrast metrology mark2024
Metrology method and associated computer product2024
Method to predict yield of a device manufacturing process2024
Method of manufacturing devices2024
Metrology system and method for determining a characteristic of one or more stru2024
Method for controlling a manufacturing process and associated apparatuses2024
Method for determining root cause affecting yield in a semiconductor manufacturi2023
Method for determining corrections for lithographic apparatus2023