Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology

Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology

US Patent 10533940 · Granted Jan 14, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Amplitude asymmetry measurements in overlay metrology2025
Scanning scatterometry overlay metrology2025
Scanning scatterometry overlay metrology2025
Grating-over-grating overlay measurement with parallel color per layer2025
Massive overlay metrology sampling with multiple measurement columns2025
Massive overlay metrology sampling with multiple measurement columns2025
3D profilometry with a Linnik interferometer2025
Oscillating secondary stage for frame-mode overlay metrology2025
Oscillating secondary stage for frame-mode overlay metrology2025
Machine and deep learning methods for spectra-based metrology and process contro2025
Scatterometry overlay metrology with orthogonal fine-pitch segmentation2025
Scanning overlay metrology with high signal to noise ratio2025