Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Oscillating secondary stage for frame-mode overlay metrology

Oscillating secondary stage for frame-mode overlay metrology

US Patent 12327741 · Granted Jun 10, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for isolation of specific fourier pupil frequency in overlay m2025
Amplitude asymmetry measurements in overlay metrology2025
Scanning scatterometry overlay metrology2025
Scanning scatterometry overlay metrology2025
Grating-over-grating overlay measurement with parallel color per layer2025
Massive overlay metrology sampling with multiple measurement columns2025
Massive overlay metrology sampling with multiple measurement columns2025
Massive overlay metrology sampling with multiple measurement columns2025
In-situ process chamber chuck cleaning by cleaning substrate2025
3D profilometry with a Linnik interferometer2025
Scatterometry overlay metrology with orthogonal fine-pitch segmentation2025
Scatterometry overlay metrology with orthogonal fine-pitch segmentation2025