Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for precleaning a substrate surface prior to epitaxial growth

Method and apparatus for precleaning a substrate surface prior to epitaxial growth

US Patent 10428441 · Granted Oct 1, 2019

Estimated economic value: $20,010,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Movable central reflectors of semiconductor processing equipment, and related sy2025
Methods for calibrating an optical emission spectrometer2025
Methods for calibrating an optical emission spectrometer2025
Growth of thin oxide layer with silicon nitride and conversion2025
Flow guide structures and heat shield structures, and related methods, for depos2025
Method and system for an intelligent artificial agent2025
Process chamber process kit with protective coating2025
Process chamber process kit with protective coating2025
Methods of selective oxidation on rapid thermal processing (RTP) chamber with ac2025
Methods of selective oxidation on rapid thermal processing (RTP) chamber with ac2025
Task prioritized experience replay algorithm for reinforcement learning2025
Dual pressure oxidation method for forming an oxide layer in a feature2025