Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Aerosol deposition coating for semiconductor chamber components

Aerosol deposition coating for semiconductor chamber components

US Patent 10418229 · Granted Sep 17, 2019

Estimated economic value: $56,752,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Halogen resistant coatings and methods of making and using thereof2025
Protective metal oxy-fluoride coatings2025
Atomic layer deposition coatings for high temperature ceramic components2025
Hafnium aluminum oxide coatings deposited by atomic layer deposition2025
Zone-controlled rare-earth oxide ALD and CVD coatings2025
Ion beam sputtering with ion assisted deposition for coatings on chamber compone2025
Ion beam sputtering with ion assisted deposition for coatings on chamber compone2025
Ion beam sputtering with ion assisted deposition for coatings on chamber compone2025
Ion beam sputtering with ion assisted deposition for coatings on chamber compone2025
Chamber components with polished internal apertures2024
Chamber components with polished internal apertures2024
Atomic layer deposition of protective coatings for semiconductor process chamber2024