Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus

RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus

US Patent 10304607 · Granted May 28, 2019

Estimated economic value: $34,437,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Film stress control for plasma enhanced chemical vapor deposition2025
Large-area high-density plasma processing chamber for flat panel displays2025
Large-area high-density plasma processing chamber for flat panel displays2025
Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-2025
Roll-aboard travel bag2024
Film stress control for plasma enhanced chemical vapor deposition2023
Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-2023
Gas diffusion shower head design for large area plasma enhanced chemical vapor d2023
RF choke for gas delivery to an RF driven electrode in a plasma processing appar2022
RF choke for gas delivery to an RF driven electrode in a plasma processing appar2022
RF choke for gas delivery to an RF driven electrode in a plasma processing appar2022
Roll-aboard garment bag2022