Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Gapfill film modification for advanced CMP and recess flow

Gapfill film modification for advanced CMP and recess flow

US Patent 10096512 · Granted Oct 9, 2018

Estimated economic value: $16,738,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Total or local thickness variation for optical devices2025
Airgap structures for improved eyepiece efficiency2025
Method for forming integrated circuit structures2025
Directional selective fill for silicon gap fill processes2025
Atomic layer deposition on optical structures2025
Methods for high-resolution, stable measurement of pitch and orientation in opti2025
Methods, systems, and apparatus for inkjet printing self-assembled monoloayer (S2025
Methods, systems, and apparatus for inkjet printing self-assembled monoloayer (S2025
Ion implantation to modify glass locally for optical devices2025
Method of measuring efficiency for optical devices2025
High index edge blackening material2025
System architecture of manufacturing of semiconductor wafers2025