Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Systems and methods for fabricating metrology targets with sub-resolution features

Systems and methods for fabricating metrology targets with sub-resolution features

US Patent 10095122 · Granted Oct 9, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate inspection apparatus and substrate inspection method2025
Semiconductor measurement apparatus2025
Scanning electron microscope device, semiconductor manufacturing device, and met2025
Pupil ellipsometry measurement apparatus and method and method of fabricating se2025
Semiconductor measurement apparatus2025
System and method for determining post bonding overlay2025
System and method for mitigating overlay distortion patterns caused by a wafer b2024
Metrology target design for tilted device designs2024
Metrology target design for tilted device designs2024
Digital holography microscope (DHM), and inspection method and semiconductor man2024
Holographic microscope and manufacturing method of semiconductor device using th2024
Metrology apparatus and method based on diffraction using oblique illumination a2024