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Home › Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor films

Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor films

US Patent 10026613 · Granted Jul 17, 2018

Estimated economic value: $37,247,000 ⓘ

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