Controlled-porosity method for forming polishing pad

Assignee

• Rohm And Haas Electronic Materials Cmp Holdings
• Dow Global Technologies

Inventors

• Yuhua Tong (8 patents)
• Andrew Wank (18 patents)
• Diego Lugo (8 patents)
• Marc R. Stack (6 patents)
• David Michael Veneziale (7 patents)
• Marty W. DeGroot (35 patents)
• George C. Jacob (33 patents)
• Jeffrey B. Miller (19 patents)

View full patent text on Google Patents →