Methods of making chemical mechanical polishing layers having improved uniformity

Assignee

• Rohm And Haas Electronic Materials Cmp Holdings

Inventors

• Bainian Qian (41 patents)
• George C. Jacob (33 patents)
• Andrew Wank (18 patents)
• David Shidner (7 patents)
• Kancharla-Arun Kumar Reddy (19 patents)
• Donna M. Alden (8 patents)
• Marty W. DeGroot (35 patents)

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