SW

Scott Waisanen

PS Particle Measuring Systems: 5 patents #13 of 64Top 25%
📍 Louisville, CO: #213 of 788 inventorsTop 30%
🗺 Colorado: #8,936 of 40,980 inventorsTop 25%
Overall (All Time): #1,032,466 of 4,157,543Top 25%
5
Patents All Time

Issued Patents All Time

Showing 1–5 of 5 patents

Patent #TitleCo-InventorsDate
RE39783 Chemical mechanical planarization (CMP) slurry quality control process and particle size distribution measuring systems Todd A. Cerni, Dennis J. Knowlton 2007-08-21
7235214 System and method for measuring molecular analytes in a measurement fluid Daniel Rodier, Dale Griffin 2007-06-26
7208123 Molecular contamination monitoring system and method Brian A. KNOLLENBERG, Daniel Rodier 2007-04-24
6275290 Chemical mechanical planarization (CMP) slurry quality control process and particle size distribution measuring systems Todd A. Cerni, Dennis J. Knowlton 2001-08-14
6246474 Method and apparatus for measurement of particle size distribution in substantially opaque slurries Todd A. Cerni 2001-06-12