Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7348188 | Method for analyzing metal element on surface of wafer | — | 2008-03-25 |
| 6726886 | Apparatus for cleaning semiconductor device | Mitsuaki Mitama | 2004-04-27 |
| 6323136 | Method of producing samples of semiconductor substrate with quantified amount of contamination | — | 2001-11-27 |
| 6277767 | Method for cleaning semiconductor device | Mitsuaki Mitama | 2001-08-21 |
| 6248997 | Method of analyzing substances existing in gas | — | 2001-06-19 |
| 6116254 | Cleaning method and system of semiconductor substrate and production method of cleaning solution | — | 2000-09-12 |
| 5824200 | Generation of electrolytically active water and wet process of a semiconductor substrate | Hiroshi Kitajima | 1998-10-20 |
| 5814157 | Method for cleaning a semiconductor wafer with an improved cleaning solution | Tetsuo Mizuniwa | 1998-09-29 |
| 5762779 | Method for producing electrolyzed water | Masaharu Nakamori, Hidemitsu Aoki, Hirofumi Seo, Haruto Hamano | 1998-06-09 |
| 5599438 | Method for producing electrolyzed water | Masaharu Nakamori, Hidemitsu Aoki, Hirofumi Seo, Haruto Hamano | 1997-02-04 |
| 5549798 | Wet processing apparatus having individual reactivating feedback paths for anode and cathode water | Hiroshi Kitajima, Hidemitsu Aoki, Haruto Hamano, Makoto Morita, Masaharu Nakamori +6 more | 1996-08-27 |
| 5543030 | Method for producing electrolyzed water | Masaharu Nakamori, Hidemitsu Aoki, Hirofumi Seo, Haruto Hamano | 1996-08-06 |
| 5522918 | Apparatus for analyzing organic substance and method for the same | — | 1996-06-04 |
| 5509970 | Method of cleaning semiconductor substrate using an aqueous acid solution | — | 1996-04-23 |
| 5472513 | Cleaning method for semiconductor substrate | — | 1995-12-05 |