Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8846773 | Method for manufacturing anion exchange resin, anion exchange resin, method for manufacturing cation exchange resin, cation exchange resin, mixed bed resin, and method for manufacturing ultrapure water for washing electronic component material | Takeo Fukui, Kazuhiko Tokunaga, Masako Yasutomi | 2014-09-30 |
| 8765825 | Method for manufacturing anion exchange resin, anion exchange resin, method for manufacturing cation exchange resin, cation exchange resin, mixed bed resin, and method for manufacturing ultrapure water for washing electronic component material | Takeo Fukui, Kazuhiko Tokunaga, Masako Yasutomi | 2014-07-01 |
| 8476324 | Method for manufacturing anion exchange resin, anion exchange resin, method for manufacturing cation exchange resin, cation exchange resin, mixed bed resin, and method for manufacturing ultrapure water for washing electronic component material | Takeo Fukui, Kazuhiko Tokunaga, Masako Yasutomi | 2013-07-02 |
| 8012755 | Water quality evaluation method and substrate contacting apparatus used | Takeo Fukui, Ikunori Yokoi | 2011-09-06 |
| 6464867 | Apparatus for producing water containing dissolved ozone | Hiroshi Morita, Osamu Ota, Kazumi Tsukamoto | 2002-10-15 |
| 6450181 | Cleaning solution for electronic materials and method for using same | Hiroshi Morita, Junichi Ida | 2002-09-17 |
| 6409918 | Apparatus for supplying ozonated ultrapure water | Hiroshi Morita, Junichi Ida | 2002-06-25 |
| 6372699 | Cleaning solution for electronic materials and method for using same | Hiroshi Morita, Junichi Ida | 2002-04-16 |
| 6346505 | Cleaning solution for electromaterials and method for using same | Hiroshi Morita, Junichi Ida | 2002-02-12 |
| 5814157 | Method for cleaning a semiconductor wafer with an improved cleaning solution | Yoshimi Shiramizu | 1998-09-29 |
| 5647989 | Method for recovering abrasive particles | Yoshihiro Hayashi, Kouichi Yabe | 1997-07-15 |
| 5106503 | Ultra-pure water supply piping system | Tadahiro Ohmi | 1992-04-21 |