HN

Hiroshi Nozue

NE Nec: 14 patents #843 of 14,502Top 6%
KT Kabushiki Kaisha Toshiba: 4 patents #6,684 of 21,451Top 35%
Dai Nippon Printing Co.: 1 patents #1,392 of 2,222Top 65%
KC Kurabe Industrial Co.: 1 patents #15 of 40Top 40%
NT Nuflare Technology: 1 patents #192 of 298Top 65%
Toshiba Memory: 1 patents #1,210 of 1,971Top 65%
Overall (All Time): #195,409 of 4,157,543Top 5%
22
Patents All Time

Issued Patents All Time

Showing 1–22 of 22 patents

Patent #TitleCo-InventorsDate
10776007 Memory management device predicting an erase count Atsushi Kunimatsu, Masaki Miyagawa, Kazuhiro Kawagome, Hiroto Nakai, Hiroyuki Sakamoto +5 more 2020-09-15
9280466 Information processing device including memory management device managing access from processor to memory and memory management method Atsushi Kunimatsu, Hiroto Nakai, Hiroyuki Sakamoto, Kenichi Maeda, Masaki Miyagawa +1 more 2016-03-08
8153996 Pattern forming apparatus and pattern forming method Takayuki Abe, Rikio Tomiyoshi 2012-04-10
7582393 Transfer mask blank, transfer mask, and transfer method using the transfer mask Hisatake Sano, Morihisa Hoga, Yukio Iimura, Yuki Aritsuka, Masaaki Kurihara +1 more 2009-09-01
7439844 Cord type thermal fuse and sheet type thermal fuse Yasuhiro Hase 2008-10-21
6042971 Method of manufacturing an EB mask for electron beam image drawing and device for manufacturing an EB mask Takao Tamura, Hiroshi Yamashita, Ken Nakajima 2000-03-28
6034375 Method of aligning a semiconductor substrate with a base stage and apparatus for doing the same 2000-03-07
5968686 Charged-beam exposure mask and charged-beam exposure method Yasuhisa Yamada 1999-10-19
5890189 Memory management and protection system for virtual memory in computer system Mitsuo Saito, Kenichi Maeda, Shigehiro Asano, Toshio Okamoto, Shin Sungho +1 more 1999-03-30
5808310 Electron beam cell projection lithography method for correcting coulomb interaction effects Hiroshi Yamashita, Takao Tamura 1998-09-15
5759722 Electron beam aperture structure and method for fabricating the same 1998-06-02
5745730 Apparatus and methods for implementing dedicated cache flushing Yoshio Masubuchi 1998-04-28
5677109 Method for E-beam writing Junko Morikawa, Hiroshi Yamashita 1997-10-14
5677756 Apparatus for exposing a semiconductor wafer to light including an illumination optical system comprising a glass substrate having light-permeable patterns 1997-10-14
5627987 Memory management and protection system for virtual memory in computer system Mitsuo Saito, Kenichi Maeda, Shigehiro Asano, Toshio Okamoto, Shin Sungho +1 more 1997-05-06
5607801 Direct patterning method of resist film using electron beam 1997-03-04
5552250 Method of manufacturing reticle 1996-09-03
5532497 Optical aligner equipped with luminance sensor on movable stage Tadao Yasuzato, Seiichi Shiraki 1996-07-02
5452053 Wafer stepper 1995-09-19
5439765 Photomask for semiconductor integrated circuit device 1995-08-08
5432587 Exposing device capable of making clear pattern image on photo resist layer having different level surfaces 1995-07-11
4791302 Semiconductor wafer for providing a plurality of semiconductor chips through electron-beam lithography 1988-12-13