Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6788107 | Variable voltage tolerant input/output circuit | — | 2004-09-07 |
| 6100561 | Method for forming LDD CMOS using double spacers and large-tilt-angle ion implantation | Min-Liang Chen | 2000-08-08 |
| 6020231 | Method for forming LDD CMOS | Min-Liang Chen | 2000-02-01 |
| 5972746 | Method for manufacturing semiconductor devices using double-charged implantation | Min-Liang Chen, San-Jung Chang, Saysamone Pittikoun | 1999-10-26 |
| 5930631 | Method of making double-poly MONOS flash EEPROM cell | Min-Liang Chen, Thomas Chang | 1999-07-27 |
| 5926712 | Process for fabricating MOS device having short channel | Min-Liang Chen, Chih-Hsun Chu, San-Jung Chang | 1999-07-20 |
| 5827747 | Method for forming LDD CMOS using double spacers and large-tilt-angle ion implantation | Min-Liang Chen | 1998-10-27 |
| 5804493 | Method for preventing substrate damage during semiconductor fabrication | Minn-Horng Juang, Cheng-Tsung Ni | 1998-09-08 |
| 5789297 | Method of making EEPROM cell device with polyspacer floating gate | Min-Liang Chen, Thomas Chang | 1998-08-04 |
| 5703388 | Double-poly monos flash EEPROM cell | Min-Liang Chen, Thomas Chang | 1997-12-30 |
| 5686324 | Process for forming LDD CMOS using large-tilt-angle ion implantation | Min-Liang Chen | 1997-11-11 |
| 5606191 | Semiconductor device with lightly doped drain regions | — | 1997-02-25 |
| 5516711 | Method for forming LDD CMOS with oblique implantation | — | 1996-05-14 |