Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12230679 | Compound semiconductor substrate including nitride semiconductor layer having varying threading dislocation densities | Sumito OUCHI, Hiroki Sukuki, Mitsuhisa Narukawa | 2025-02-18 |
| 12087852 | Compound semiconductor device, compound semiconductor substrate, and method for manufacturing compound semiconductor device | Shigeomi HISHIKI | 2024-09-10 |
| 11316018 | Compound semiconductor substrate including electron transition layer and barrier layer | Mitsuhisa Narukawa, Sumito OUCHI, Hiroki Suzuki | 2022-04-26 |
| 10354864 | Compound semiconductor substrate with SiC layer | Mitsuhisa Narukawa, Akira Fukazawa, Hiroki Suzuki | 2019-07-16 |
| 10253843 | Vibration reduction apparatus of hybrid vehicle | Masato Shigenaga | 2019-04-09 |
| 10186421 | Composite semiconductor substrate | Akira Fukazawa, Mitsuhisa Narukawa | 2019-01-22 |
| 10086841 | Control apparatus for transmission | Keiji Kuzuhara, Takumi Kawano, Yasuyuki Masaoka | 2018-10-02 |
| 8986448 | Method of manufacturing single crystal 3C-SiC substrate and single crystal 3C-SiC substrate obtained from the manufacturing method | Hidetoshi Asamura, Satoshi Obara | 2015-03-24 |
| 8931432 | Vacuum processing apparatus | Hiroshi Mashima | 2015-01-13 |
| 8563442 | Method for manufacturing nitrogen compound semiconductor substrate and nitrogen compound semiconductor substrate, and method for manufacturing single crystal SiC substrate and single crystal SiC substrate | Katsutoshi Izumi, Hidetoshi Asamura, Takashi Yokoyama | 2013-10-22 |
| 8529704 | Vacuum processing apparatus and operating method for vacuum processing apparatus | Eishiro Sasakawa, Masahiro Sakaki, Shigekazu Ueno, Akemi Takano | 2013-09-10 |
| 7833587 | Method for plasma-enhanced chemical vapor deposition and apparatus for plasma-enhanced chemical vapor deposition | Hiroshi Mashima, Akira Yamada, Kenji Tagashira, Yoshiaki Takeuchi | 2010-11-16 |
| 7319295 | High-frequency power supply structure and plasma CVD device using the same | Hiroshi Mashima, Akemi Takano, Yoshiaki Takeuchi, Tetsuro Shigemizu, Tatsufumi Aoi | 2008-01-15 |
| 7204887 | Wafer holding, wafer support member, wafer boat and heat treatment furnace | Tsutomu Sasaki, Atsuki Matsumura, Atsushi Ikari, Isao Hamaguchi, Yoshiharu Inoue +2 more | 2007-04-17 |
| 7205034 | Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus | Akemi Takano, Hiroshi Mashima, Hiromu Takatuka, Yasuhiro Yamauti, Yoshiaki Takeuchi +1 more | 2007-04-17 |
| 7167358 | Information terminal apparatus | Yuuki Iwasaki, Akira Sato, Masayasu Watanabe | 2007-01-23 |
| 7141516 | High frequency plasma generator and high frequency plasma generating method | Akira Yamada, Hiroshi Mashima, Yoshiaki Takeuchi | 2006-11-28 |
| 7067402 | Production method for SIMOX substrate and SIMOX substrate | Atsuki Matsumura, Yoichi Nagatake, Seiji Takayama | 2006-06-27 |
| 6767801 | Simox substrate and method for production thereof | Atsuki Matsumura, Toshiyuki Mizutani | 2004-07-27 |
| 6617034 | SOI substrate and method for production thereof | Isao Hamaguchi, Atsushi Ikari, Atsuki Matsumura, Takayuki Yano, Yoichi Nagatake | 2003-09-09 |
| 6558637 | Exhaust emission purifier | Yasuki Tamura, Kazuo Koga, Kojiro Okada, Osamu Nakayama, Kiyoshi Kawamura +1 more | 2003-05-06 |
| 6558636 | Plasma type exhaust gas cleaning apparatus | Yasuki Tamura, Kojiro Okada, Kazuo Koga, Osamu Nakayama, Kiyoshi Kawamura | 2003-05-06 |
| 6344701 | Pulse generator for treating exhaust gas | Tetsuro Shigemizu, Hirohisa Yoshida, Masayoshi Murata | 2002-02-05 |
| 6274006 | Apparatus and method for treating exhaust gas and pulse generator used therefor | Tetsuro Shigemizu, Hirohisa Yoshida, Masayoshi Murata | 2001-08-14 |
| 6007681 | Apparatus and method for treating exhaust gas and pulse generator used therefor | Tetsuro Shigemizu, Hirohisa Yoshida, Masayoshi Murata | 1999-12-28 |