Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6048653 | Polymerizable composition for a color filter | Ryuichiro Takasaki, Noriko Endou, Yuzuru Chika | 2000-04-11 |
| 5916713 | Polymerizable composition for a color filter | Ryuichiro Takasaki, Noriko Endou, Yuzuru Chika | 1999-06-29 |
| 5800952 | Photopolymerizable composition for a color filter, color filter and liquid display device | Toshiyuki Urano, Ryuichiro Takasaki, Jiro Kamimura, Shingo Ikeda, Noriko Endo +1 more | 1998-09-01 |
| 5532342 | Azo metal chelate compound | Yutaka Kurose, Takumi Nagao, Takako Tsukahara, Satoru Imamura | 1996-07-02 |
| 5529885 | Negative photosensitive composition and method for forming patterns using the composition | Ryuichiro Takasaki, Yasuhiro Kameyama, Shichiro Takahashi | 1996-06-25 |
| 5447823 | Metal chelate compound and optical recording medium using the compound | Yutaka Kurose, Takumi Nagao, Takako Tsukahara, Satoru Imamura | 1995-09-05 |
| 5292614 | Negative photosensitive composition and method for forming a resist pattern | Noriaki Takahashi, Tomoyo Ishiguro | 1994-03-08 |
| 5286600 | Negative photosensitive composition and method for forming a resist pattern by means thereof | Noriaki Takahashi, Yasuhiro Kameyama | 1994-02-15 |
| 5168030 | Positive type o-quinone diazide photo-resist containing antistatic agent selected from hydrazones, ethylcarbazole and bis(dimethylamino)benzene | Konoe Miura, Yasuhiro Kameyama, Tooru Koyama, Takashi Okabe, Tomoharu Mametani | 1992-12-01 |
| 4933257 | Positive quinone diazide photo-resist composition with antistatic agent | Konoe Miura, Yasuhiro Kameyama, Tooru Koyama, Takashi Okabe, Tomoharu Mametani | 1990-06-12 |
| 4859563 | Positive photoresist composition | Konoe Miura, Yasuhiro Kameyama | 1989-08-22 |
| 4725523 | Positive photosensitive compositions with 1,2-naphthoquinone diazide and novolak resin prepared from .alpha.-naphthol and p-cresol | Konoe Miura, Hideki Nagasaka, Noriaki Takahashi, Ryuichiro Takasaki | 1988-02-16 |
| 4719167 | Positive photoresist composition with 1,2 naphthoquinone diazide and novolak resin condensed from mixture of m-cresol, p-cresol, and 2,5-xylenol with formaldehyde | Konoe Miura, Yasuhiro Kameyama | 1988-01-12 |
| 4650741 | Positive photosensitive composition of cocondensed .beta.-naphthol and m-cresol with aldehyde in admixture with sulfonyl triester of a 1,2-naphthoquinone-1-diazide | Konoe Miura, Hideki Nagasaka, Noriaki Takahashi, Ryuichiro Takasaki | 1987-03-17 |