HN

Hideki Nagasaka

MC Mitsubishi Chemical: 12 patents #161 of 3,022Top 6%
MK Mitsubishi Kasei: 3 patents #121 of 911Top 15%
KF Kabushiki Kaisha F.C.C.: 1 patents #80 of 204Top 40%
Overall (All Time): #297,342 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
9580060 Power transmitting apparatus Masayuki Nonaka, Go Ando, Hideyuki Oishi 2017-02-28
6808861 Positive photosensitive composition positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate Akihisa Murata 2004-10-26
6410207 Positive photosensitive composition, positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate Akihisa Murata 2002-06-25
6326122 Positive photosensitive composition, positive photosensitive lithographic plate and method for making positive photosensitive lithographic printing plate Akihisa Murata 2001-12-04
6074802 Positive photosensitive composition, positive photosensitive lithographic printing plate and method for its treatment Akihisa Murata 2000-06-13
5814431 Photosensitive composition and lithographic printing plate Akihisa Murata, Toshiyuki Urano, Ryuichiro Takasaki 1998-09-29
5738974 Photopolymerizable composition and photosensitive lithographic printing plate Toshiyuki Urano, Akihisa Murata 1998-04-14
5607817 Photopolymerizable composition Masaaki Tsuchiyama, Toshiyuki Urano 1997-03-04
5498641 Polymerizable composition containing pyrromethene type coloring matter and titanocene compound Toshiyuki Urano, Masaaki Tsuchiyama, Hiroshi Ide 1996-03-12
5219709 Photopolymerizable composition Katsuko Ohta 1993-06-15
4985470 Photopolymerizable compositions Noriaki Takahashi 1991-01-15
4966830 Photopolymerizable composition Katsuko Ohta 1990-10-30
4725523 Positive photosensitive compositions with 1,2-naphthoquinone diazide and novolak resin prepared from .alpha.-naphthol and p-cresol Konoe Miura, Noriaki Takahashi, Tameichi Ochiai, Ryuichiro Takasaki 1988-02-16
4650741 Positive photosensitive composition of cocondensed .beta.-naphthol and m-cresol with aldehyde in admixture with sulfonyl triester of a 1,2-naphthoquinone-1-diazide Konoe Miura, Noriaki Takahashi, Tameichi Ochiai, Ryuichiro Takasaki 1987-03-17
4594310 Photopolymerizable composition comprising tertiary aromatic amine and hexaarylbiimazole initiators 1986-06-10
4396696 Electrophotographic plate having azo compound photosensitive layer Tetsuo Murayama 1983-08-02