Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5542970 | Monoazo compound and recording liquid containing the same | Hiroshi Takimoto, Tokuya Ohta, Masatsune Kobayashi | 1996-08-06 |
| 5168030 | Positive type o-quinone diazide photo-resist containing antistatic agent selected from hydrazones, ethylcarbazole and bis(dimethylamino)benzene | Tameichi Ochiai, Yasuhiro Kameyama, Tooru Koyama, Takashi Okabe, Tomoharu Mametani | 1992-12-01 |
| 5037575 | Squarilium compound and liquid crystal composition containing the same | Tetsuo Ozawa, Junko Iwanami | 1991-08-06 |
| 5013474 | Liquid crystal display device | Kunihiko Arai, Tetsuo Urabe, Tetsuya Morita, Tetsuo Ozawa, Junko Iwanami | 1991-05-07 |
| 4985171 | Anthraquinone type compound and liquid crystal composition containing such compound | Tetsuo Ozawa, Junko Kanaya | 1991-01-15 |
| 4959172 | Liquid crystal composition containing a pleochroic azo type compound | Tetsuo Ozawa, Keiko Yoneyama | 1990-09-25 |
| 4933257 | Positive quinone diazide photo-resist composition with antistatic agent | Tameichi Ochiai, Yasuhiro Kameyama, Tooru Koyama, Takashi Okabe, Tomoharu Mametani | 1990-06-12 |
| 4921959 | Anthraquinone compounds and polarizing film containing the same | Tetsuo Ozawa, Seigo Okumura, Shinji Kubo | 1990-05-01 |
| 4859563 | Positive photoresist composition | Tameichi Ochiai, Yasuhiro Kameyama | 1989-08-22 |
| 4841057 | Cyclic imido anthraquinone compounds | Tetsuo Ozawa, Seigo Okumura, Shinji Kubo | 1989-06-20 |
| 4840640 | Polarizing film: polymer film base containing substituted anthraquinone dichroic dye | Tetsuo Ozawa, Seigo Okumura, Hidetoshi Urashima | 1989-06-20 |
| 4841037 | Amino sulfonaphtholtrisazo compounds and recording liquids containing the same | Tokuya Ohta, Masatsune Kobayashi, Yuko Suga, Hiroshi Takimoto, Tomio Yoneyama | 1989-06-20 |
| 4765838 | Water-soluble dye composition and recording liquid containing the same | Tokuya Ohata, Masatsune Kobayashi, Yuko Suga, Hiroshi Takimoto, Tomio Yoneyama | 1988-08-23 |
| 4725523 | Positive photosensitive compositions with 1,2-naphthoquinone diazide and novolak resin prepared from .alpha.-naphthol and p-cresol | Hideki Nagasaka, Noriaki Takahashi, Tameichi Ochiai, Ryuichiro Takasaki | 1988-02-16 |
| 4724001 | Disazoic dye and recording liquid containing the same | Tokuya Ohta, Masatsune Kobayashi, Yuko Suga, Hiroshi Takimoto, Tomio Yoneyama | 1988-02-09 |
| 4719167 | Positive photoresist composition with 1,2 naphthoquinone diazide and novolak resin condensed from mixture of m-cresol, p-cresol, and 2,5-xylenol with formaldehyde | Tameichi Ochiai, Yasuhiro Kameyama | 1988-01-12 |
| 4650741 | Positive photosensitive composition of cocondensed .beta.-naphthol and m-cresol with aldehyde in admixture with sulfonyl triester of a 1,2-naphthoquinone-1-diazide | Hideki Nagasaka, Noriaki Takahashi, Tameichi Ochiai, Ryuichiro Takasaki | 1987-03-17 |
| 4626284 | Recording liquid | Tokuya Ohta, Masatsune Kobayashi, Hiroshi Takimoto | 1986-12-02 |
| 4403030 | Photosensitive lithographic printing plate material | Shin-ichi Tanaka, Hiroshi Kojima, Takeshi Tanaka, Osamu Matsushita | 1983-09-06 |
| 4267260 | Developer for lithographic printing plate | Chihiro Eguchi, Yoshihiro Takahashi, Akinobu Oshima, Kazuo Torige, Shinichi Bunya | 1981-05-12 |