Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8092981 | Negative photoresist composition and method of manufacturing array substrate using the same | Hoon Kang, Jae-Sung Kim, Yang-Ho Jung, Hi-Kuk Lee, Yuuji Mizuho +2 more | 2012-01-10 |
| 6815033 | Compound, optical recording medium and optical recording method | Takashi Miyazawa, Shuichi Maeda | 2004-11-09 |
| 5529885 | Negative photosensitive composition and method for forming patterns using the composition | Tameichi Ochiai, Ryuichiro Takasaki, Shichiro Takahashi | 1996-06-25 |
| 5286600 | Negative photosensitive composition and method for forming a resist pattern by means thereof | Tameichi Ochiai, Noriaki Takahashi | 1994-02-15 |
| 5168030 | Positive type o-quinone diazide photo-resist containing antistatic agent selected from hydrazones, ethylcarbazole and bis(dimethylamino)benzene | Konoe Miura, Tameichi Ochiai, Tooru Koyama, Takashi Okabe, Tomoharu Mametani | 1992-12-01 |
| 4933257 | Positive quinone diazide photo-resist composition with antistatic agent | Konoe Miura, Tameichi Ochiai, Tooru Koyama, Takashi Okabe, Tomoharu Mametani | 1990-06-12 |
| 4859563 | Positive photoresist composition | Konoe Miura, Tameichi Ochiai | 1989-08-22 |
| 4719167 | Positive photoresist composition with 1,2 naphthoquinone diazide and novolak resin condensed from mixture of m-cresol, p-cresol, and 2,5-xylenol with formaldehyde | Konoe Miura, Tameichi Ochiai | 1988-01-12 |