Issued Patents All Time
Showing 101–110 of 110 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5950092 | Use of a plasma source to form a layer during the formation of a semiconductor device | Thomas A. Figura, Thomas J. Dunbar | 1999-09-07 |
| 5906950 | Selective etch process | David J. Keller | 1999-05-25 |
| 5904799 | Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks | — | 1999-05-18 |
| 5882535 | Method for forming a hole in a semiconductor device | Richard L. Stocks | 1999-03-16 |
| 5783100 | Method of high density plasma etching for semiconductor manufacture | Guy T. Blalock | 1998-07-21 |
| 5759922 | Control of etch profiles during extended overetch | — | 1998-06-02 |
| 5662770 | Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks | — | 1997-09-02 |
| 5651856 | Selective etch process | David J. Keller | 1997-07-29 |
| 5449433 | Use of a high density plasma source having an electrostatic shield for anisotropic polysilicon etching over topography | — | 1995-09-12 |
| 5225024 | Magnetically enhanced plasma reactor system for semiconductor processing | Peter R. Hanley, Stephen E. Savas, Karl B. Levy, Neeta Jha | 1993-07-06 |