Issued Patents All Time
Showing 76–100 of 110 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6258728 | Plasma etching methods | Richard L. Stocks | 2001-07-10 |
| 6234219 | Liner for use in processing chamber | — | 2001-05-22 |
| 6228775 | Plasma etching method using low ionization potential gas | John W. Coburn | 2001-05-08 |
| 6204604 | Method and apparatus for controlling electrostatic coupling to plasmas | — | 2001-03-20 |
| 6184146 | Plasma producing tools, dual-source plasma etchers, dual-source plasma etching methods, and method of forming planar coil dual-source plasma etchers | Guy T. Blalock | 2001-02-06 |
| 6136720 | Plasma processing tools dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers | Guy T. Blalock | 2000-10-24 |
| 6132552 | Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor | Guy T. Blalock | 2000-10-17 |
| 6126778 | Beat frequency modulation for plasma generation | Marvin F. Hagedorn | 2000-10-03 |
| 6123862 | Method of forming high aspect ratio apertures | David S. Becker | 2000-09-26 |
| 6123802 | Method and apparatus for preventing plasma formation | — | 2000-09-26 |
| 6117764 | Use of a plasma source to form a layer during the formation of a semiconductor device | Thomas A. Figura, Thomas J. Dunbar | 2000-09-12 |
| 6114252 | Plasma processing tools, dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers | Guy T. Blalock | 2000-09-05 |
| 6095159 | Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities | Guy T. Blalock | 2000-08-01 |
| 6093655 | Plasma etching methods | Richard L. Stocks | 2000-07-25 |
| 6087270 | Method of patterning substrates | Alan R. Reinberg, Brian A. Vaartstra | 2000-07-11 |
| 6074957 | Methods of forming openings and methods of controlling the degree of taper of openings | Richard L. Stocks | 2000-06-13 |
| 6074953 | Dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers | Guy T. Blalock | 2000-06-13 |
| 6051511 | Method and apparatus for reducing isolation stress in integrated circuits | Randhir P. S. Thakur, Zhiqiang Wu, Alan R. Reinberg | 2000-04-18 |
| 6030902 | Apparatus and method for improving uniformity in batch processing of semiconductor wafers | — | 2000-02-29 |
| 6025276 | Semiconductor processing methods of forming substrate features, including contact openings | Werner Juengling | 2000-02-15 |
| 6010967 | Plasma etching methods | Richard L. Stocks | 2000-01-04 |
| 5998931 | Method and apparatus for controlling electrostatic coupling to plasmas | — | 1999-12-07 |
| 5986347 | Processing methods of forming contact openings and integrated circuitry | Kirk D. Prall | 1999-11-16 |
| 5985375 | Method for pulsed-plasma enhanced vapor deposition | Gurtej S. Sandhu | 1999-11-16 |
| 5976985 | Processing methods of forming contact openings and integrated circuitry | Kirk D. Prall | 1999-11-02 |