Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7683487 | Structure applied to a photolithographic process | Yun-Chu Lin, Wen-Chung Chang, Ching-Yi Lee | 2010-03-23 |
| 7586609 | Method for analyzing overlay errors | Chen-Fu Chien, Chia-Yu Hsu, I-Pien Wu | 2009-09-08 |
| 7157215 | Photoresist with adjustable polarized light reaction and photolithography process using the photoresist | Wei-Hua Hsu | 2007-01-02 |
| 7132334 | Methods of code programming a mask ROM device | — | 2006-11-07 |
| 7008870 | Structure applied to a photolithographic process and method for fabricating a semiconductor device | Yun-Chu Lin, Wen-Chung Chang, Ching-Yi Lee | 2006-03-07 |
| 6975974 | Overlay error model, sampling strategy and associated equipment for implementation | Chen-Fu Chien, Kuo-Hao Chang, Chih-Ping Chen | 2005-12-13 |
| 6960411 | Mask with extended mask clear-out window and method of dummy exposure using the same | Yu-Lin Yen, Ching-Yu Chang | 2005-11-01 |
| 6660458 | Method of optical proximity correction | — | 2003-12-09 |
| 6627388 | Method for reducing roughness of photoresist through cross-linking reaction of deposit and photoresist | Chi-Fang Hsieh | 2003-09-30 |
| 6576407 | Method of improving astigmatism of a photoresist layer | Wei-Hua Hsu | 2003-06-10 |
| 6563127 | Optical proximity correction with rectangular contact | Tsung-Hsien Wu | 2003-05-13 |
| 6348384 | Method of using organic polymer as covering layer for device lightly doped drain structure | — | 2002-02-19 |