Issued Patents All Time
Showing 26–50 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9097975 | Double patterning by PTD and NTD process | — | 2015-08-04 |
| 9082802 | Wafer centering hardware design and process | — | 2015-07-14 |
| 8999838 | Semiconductor devices and methods of manufacturing the same | — | 2015-04-07 |
| 8847122 | Method and apparatus for transferring substrate | — | 2014-09-30 |
| 8835100 | Double patterning by PTD and NTD process | — | 2014-09-16 |
| 8835103 | Lithography process and structures | — | 2014-09-16 |
| 8804096 | Apparatus for and method of wafer edge exposure | — | 2014-08-12 |
| 8530147 | Patterning process | — | 2013-09-10 |
| 8383512 | Method for making multilayer connection structure | Shih-Hung Chen, Hang-Ting Lue, Hong-Ji Lee | 2013-02-26 |
| 8367981 | Baking apparatus, baking method and method of reducing gap width | — | 2013-02-05 |
| 8343713 | Method for patterning material layer | Chih-Hao Huang, Tzong-Hsien Wu, Tien-Chu Yang | 2013-01-01 |
| 8278770 | Overlay mark | — | 2012-10-02 |
| 8232203 | Methods of manufacturing memory devices | — | 2012-07-31 |
| 8183123 | Method of forming mark in IC-fabricating process | — | 2012-05-22 |
| 8084872 | Overlay mark, method of checking local aligmnent using the same and method of controlling overlay based on the same | — | 2011-12-27 |
| 8076758 | Wafer structure | — | 2011-12-13 |
| 8049345 | Overlay mark | Chih-Hao Huang | 2011-11-01 |
| 8012675 | Method of patterning target layer on substrate | — | 2011-09-06 |
| 7998826 | Method of forming mark in IC-fabricating process | — | 2011-08-16 |
| 7952213 | Overlay mark arrangement for reducing overlay shift | Chun-Chung Huang | 2011-05-31 |
| 7939225 | Mask for controlling line end shortening and corner rounding arising from proximity effects | Chiao-Wen Yeh, Chih-Haw Huang | 2011-05-10 |
| 7927960 | Method of improving overlay performance in semiconductor manufacture | Chih-Hao Huang | 2011-04-19 |
| 7923175 | Photomask structure | Chun-Chung Huang | 2011-04-12 |
| 7901872 | Exposure process and photomask set used therein | Chih-Hao Huang | 2011-03-08 |
| 7880274 | Method of enabling alignment of wafer in exposure step of IC process after UV-blocking metal layer is formed over the whole wafer | — | 2011-02-01 |