Issued Patents All Time
Showing 51–68 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7862986 | Patterning process | — | 2011-01-04 |
| 7684040 | Overlay mark and application thereof | — | 2010-03-23 |
| 7652284 | Process monitor mark and the method for using the same | — | 2010-01-26 |
| 7645546 | Method for determining an overlay correlation set | Chih-Hao Huang | 2010-01-12 |
| 7611961 | Method for fabricating semiconductor wafer with enhanced alignment performance | — | 2009-11-03 |
| 7599063 | Method for checking alignment accuracy using overlay mark | — | 2009-10-06 |
| 7566526 | Method of exposure for lithography process and mask therefor | — | 2009-07-28 |
| 7566516 | Photomask and method of manufacturing the same | — | 2009-07-28 |
| 7563690 | Method for forming shallow trench isolation region | — | 2009-07-21 |
| 7493588 | Mixing and matching method and integration system for providing backup strategries for optical environments and method for operating the same | — | 2009-02-17 |
| 7449792 | Pattern registration mark designs for use in photolithography and methods of using the same | Chih-Hao Huang | 2008-11-11 |
| 7432605 | Overlay mark, method for forming the same and application thereof | Chih-Hao Huang | 2008-10-07 |
| 7413834 | Photomask with alignment marks for the current layer | — | 2008-08-19 |
| 7358145 | Method of fabricating shallow trench isolation structure | — | 2008-04-15 |
| 6983444 | Mask for reducing proximity effect | — | 2006-01-03 |
| 6905899 | Methods for forming a photoresist pattern using an anti-optical proximity effect | — | 2005-06-14 |
| 6864185 | Fine line printing by trimming the sidewalls of pre-developed resist image | Ta-Hung Yang, Ching-Yu Chang | 2005-03-08 |
| 4581611 | Character display system | Shinsaku Fujikawa, Masashi Utsumi | 1986-04-08 |