Issued Patents All Time
Showing 76–100 of 102 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6375616 | Automatic fetal weight determination | Ziv Soferman | 2002-04-23 |
| 6347291 | Substrate position location system | — | 2002-02-12 |
| 6315724 | 3-dimensional ultrasonic imaging | James Gessert, Wayne E. Moore, Rachel Nechushtai, Hillel Rom, Ziv Soferman | 2001-11-13 |
| 6297558 | Slurry filling a recess formed during semiconductor fabrication | — | 2001-10-02 |
| 6273798 | Pre-conditioning polishing pads for chemical-mechanical polishing | — | 2001-08-14 |
| 6234883 | Method and apparatus for concurrent pad conditioning and wafer buff in chemical mechanical polishing | Karey Holland | 2001-05-22 |
| 6223503 | Hot pour product sampler and method of making using bulk thin film application techniques | William Deierlein | 2001-05-01 |
| 6182420 | Method of making a cosmetic sampler using bulk thin film application techniques | William Deierlein, Michael A. Parrotta, Phillip Cameron, Allan Cameron | 2001-02-06 |
| 6108093 | Automated inspection system for residual metal after chemical-mechanical polishing | — | 2000-08-22 |
| 6070392 | Hot pour product sampler and method of making using bulk thin film application techniques | William Deierlein | 2000-06-06 |
| 6069085 | Slurry filling a recess formed during semiconductor fabrication | — | 2000-05-30 |
| 5990010 | Pre-conditioning polishing pads for chemical-mechanical polishing | — | 1999-11-23 |
| 5990789 | System and method for preventing smoke and fire damage to people and equipment in a clean room area from a fire | Joseph B. Barsky | 1999-11-23 |
| 5985679 | Automated endpoint detection system during chemical-mechanical polishing | — | 1999-11-16 |
| 5957757 | Conditioning CMP polishing pad using a high pressure fluid | — | 1999-09-28 |
| 5953885 | Cosmetic sampler and method of making using bulk thin film application techniques | William Deierlein, Michael A. Parrotta, Phillip Cameron, Allan Cameron | 1999-09-21 |
| 5893756 | Use of ethylene glycol as a corrosion inhibitor during cleaning after metal chemical mechanical polishing | Jayashree Kalpathy-Cramer | 1999-04-13 |
| 5885701 | Odorant composition delivery system and method | Michael A. Parrotta, Frank Flynn | 1999-03-23 |
| 5882251 | Chemical mechanical polishing pad slurry distribution grooves | Jayashree Kalpathy-Cramer | 1999-03-16 |
| 5835226 | Method for determining optical constants prior to film processing to be used improve accuracy of post-processing thickness measurements | Jayashree Kalpathy-Cramer, Eric Jacob Jan Kirchner, Thomas F. A. Bibby | 1998-11-10 |
| 5637401 | Odorant composition, delivery system and method | Michael A. Parrotta, Frank Flynn | 1997-06-10 |
| 5589260 | Method and apparatus for producing plastic products | Guy Ben Zvi, Shlomo Nevo | 1996-12-31 |
| 5298966 | Measurement system | — | 1994-03-29 |
| 5156700 | Method and apparatus for making three-dimensional objects | Orit Kazav | 1992-10-20 |
| 5091861 | System for automatic finishing of machine parts | Yair GELLER, Orit Katsav | 1992-02-25 |