| 7014956 |
Active secondary exposure mask to manufacture integrated circuits |
Jeff Farnsworth, Wen-Hao Cheng |
2006-03-21 |
| 6942958 |
Modifying circuitry features in radiation sensitive layers with active secondary exposure masks |
Jeff Farnsworth, Wen-Hao Cheng |
2005-09-13 |
| 6210843 |
Modulation of peripheral critical dimension on photomask with differential electron beam dose |
Wilman Tsai, Yoshihiro Tezuka, Steven Labovitz, Jeff Farnsworth |
2001-04-03 |
| 6174798 |
Process for forming metal interconnect stack for integrated circuit structure |
Shouli Steve Hsia, Zhihai Wang |
2001-01-16 |
| 6147409 |
Modified multilayered metal line structure for use with tungsten-filled vias in integrated circuit structures |
Shouli Steve Hsia, Jiunn-Yann Tsai |
2000-11-14 |
| 6087726 |
Metal interconnect stack for integrated circuit structure |
Shouli Steve Hsia, Zhihai Wang |
2000-07-11 |
