SW

Syd R. Wilson

LM Lockheed Martin: 1 patents #2,805 of 6,507Top 45%
📍 Phoenix, AZ: #322 of 6,660 inventorsTop 5%
🗺 Arizona: #1,901 of 32,909 inventorsTop 6%
Overall (All Time): #260,210 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Showing 1–18 of 18 patents

Patent #TitleCo-InventorsDate
6355541 Method for transfer of thin-film of silicon carbide via implantation and wafer bonding Orin W. Holland, Darrell Keith Thomas, Richard B. Gregory, Thomas A. Wetteroth 2002-03-12
6180495 Silicon carbide transistor and method therefor Charles E. Weitzel, Mohit K. Bhatnagar, Karen E. Moore, Thomas A. Wetteroth 2001-01-30
5933750 Method of fabricating a semiconductor device with a thinned substrate Charles E. Weitzel, Mohit K. Bhatnagar, Karen E. Moore, Thomas A. Wetteroth 1999-08-03
5753560 Method for fabricating a semiconductor device using lateral gettering Stella Q. Hong, Thomas A. Wetteroth 1998-05-19
5700721 Structure and method for metallization of semiconductor devices Hank Hukyoo Shin, Clarence J. Tracy, Robert L. Duffin, John L. Freeman, Jr., Gordon M. Grivna 1997-12-23
5554889 Structure and method for metallization of semiconductor devices Hank Hukyoo Shin, Clarence J. Tracy, Robert L. Duffin, John L. Freeman, Jr., Gordon M. Grivna 1996-09-10
5424245 Method of forming vias through two-sided substrate Richard W. Gurtler, Jeffrey Pearse 1995-06-13
5217920 Method of forming substrate contact trenches and isolation trenches using anodization for isolation Robert J. Mattox, Paul Proctor 1993-06-08
5112772 Method of fabricating a trench structure Han-Bin K. Liang, Thomas E. Zirkle, Yee-Chaung See 1992-05-12
4943539 Process for making a multilayer metallization structure James Sellers, Robert J. Mattox 1990-07-24
4799392 Method for determining silicon (mass 28) beam purity prior to implantation of gallium arsenide Robert P. Lorigan, Richard L. Peterson 1989-01-24
H569 Charge storage depletion region discharge protection Charles J. Varker 1989-01-03
4740481 Method of preventing hillock formation in polysilicon layer by oxygen implanation Richard B. Gregory, Charles J. Varker 1988-04-26
4732866 Method for producing low noise, high grade constant semiconductor junctions Jerry L. Chruma, William Gandy, Tommie R. Huffman 1988-03-22
4717588 Metal redistribution by rapid thermal processing Wayne M. Paulson, Charles J. Varker 1988-01-05
4683637 Forming depthwise isolation by selective oxygen/nitrogen deep implant and reaction annealing Charles J. Varker, Marie E. Burnham 1987-08-04
4682407 Means and method for stabilizing polycrystalline semiconductor layers Richard B. Gregory, Charles J. Varker 1987-07-28
4621413 Fabricating a semiconductor device with reduced gate leakage Arthur T. Lowe, Schyi-yi Wu 1986-11-11