Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9196497 | Photolytic processing of materials with hydrogen | Ryan J. Cottier, Terry D. Golding, Khalid S. Hossain, Ronald Paul Hellmer | 2015-11-24 |
| 6355541 | Method for transfer of thin-film of silicon carbide via implantation and wafer bonding | Darrell Keith Thomas, Richard B. Gregory, Syd R. Wilson, Thomas A. Wetteroth | 2002-03-12 |
| 6222253 | Buried oxide layer in silicon | Devendra K. Sadana | 2001-04-24 |
| 6090689 | Method of forming buried oxide layers in silicon | Devendra K. Sadana | 2000-07-18 |
| 5661044 | Processing method for forming dislocation-free SOI and other materials for semiconductor use | Darrell Keith Thomas, Dashun Steve Zhou | 1997-08-26 |
| 4928156 | N-channel MOS transistors having source/drain regions with germanium | John R. Alvis, James R. Pfiester | 1990-05-22 |
| 4920076 | Method for enhancing growth of SiO.sub.2 in Si by the implantation of germanium | Dariush Fathy, Clark W. White | 1990-04-24 |
| 4908334 | Method for forming metallic silicide films on silicon substrates by ion beam deposition | Raymond A. Zuhr | 1990-03-13 |
| 4837173 | N-channel MOS transistors having source/drain regions with germanium | John R. Alvis, James R. Pfiester | 1989-06-06 |
| 4748134 | Isolation process for semiconductor devices | John R. Alvis | 1988-05-31 |
| 4743563 | Process of controlling surface doping | James R. Pfiester, John R. Alvis | 1988-05-10 |
| 4728619 | Field implant process for CMOS using germanium | James R. Pfiester, John R. Alvis | 1988-03-01 |
| 4704367 | Suppression of hillock growth through multiple thermal cycles by argon implantation | John R. Alvis | 1987-11-03 |