Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11274364 | Sputter devices and methods | Martin Portka, Markus Kress, Florian Schwarz | 2022-03-15 |
| 8132268 | Apparatus and method for the detection of forces in the sub-micronewton range | Thorsten Hugel | 2012-03-06 |
| 7727632 | Glass coating | Gerd Kleideiter, Anton Zmelty, Armin Reus, Manfred Ruske | 2010-06-01 |
| 7651774 | Glass coating | Gerd Kleideiter, Anton Zmelty | 2010-01-26 |
| 6164130 | Electromagnetic measuring system for meteorology | Michael J. Pabst, Gregor Bugla | 2000-12-26 |
| 5399254 | Apparatus for plasma treatment | Michael Jung | 1995-03-21 |
| 5378284 | Apparatus for coating substrates using a microwave ECR plasma source | Rudolf Koetter-Faulhaber, Michael Jung | 1995-01-03 |
| 5296784 | Apparatus for the production of glow discharge | Michael Jung, Rudolf Koetter-Faulhaber | 1994-03-22 |
| 5294464 | Method for producing a reflective surface on a substrate | Rudolf Koetter-Faulhaber, Susanne Wuerz | 1994-03-15 |
| 5283538 | Apparatus for coupling microwave power out of a first space into a second space | Michael Jung, Bernhard Kessler | 1994-02-01 |
| 5259603 | Device for mounting and transporting substrates in vacuum apparatus | Michael Jung | 1993-11-09 |
| 5173640 | Apparatus for the production of a regular microwave field | Michael Jung, Bernhard Kessler | 1992-12-22 |
| 5118549 | Optical recording medium | Alfons Hausler, Rainer Ludwig, Michael Jung | 1992-06-02 |
| 5113790 | Apparatus for the plasma treatment of substrates | Michael Jung, Rudolf K. Faulhaber | 1992-05-19 |
| 5102523 | Arrangement for the production of a plasma | Siegfried Beisswenger, Barbara Beichler, Stefan Reineck | 1992-04-07 |
| 5053244 | Process for depositing silicon oxide on a substrate | Jorg Kieser, Rolf Wilhelm, Eberhard Rauchle | 1991-10-01 |
| 5006219 | Microwave cathode sputtering arrangement | Rudolf Latz, Michael Scherer, Michael Jung | 1991-04-09 |
| 4987346 | Particle source for a reactive ion beam etching or plasma deposition installation | Werner Katzschner, Stefan Eichholz, Michael Jung | 1991-01-22 |
| 4939424 | Apparatus for producing a plasma and for the treatment of substrates | Jorg Kieser, Rolf Wilhelm, Eberhard Rauchle | 1990-07-03 |
| 4933064 | Sputtering cathode based on the magnetron principle | Jorg Kieser, Reiner Kukla | 1990-06-12 |
| 4767641 | Plasma treatment apparatus | Jorg Kieser, Michael Sellschopp | 1988-08-30 |