| 5498291 |
Arrangement for coating or etching substrates |
Manfred Arnold, Guido Blang, Rainer Gegenwart, Helmut Stoll |
1996-03-12 |
| 5423971 |
Arrangement for coating substrates |
Manfred Arnold, Guido Blang, Rainer Gegenwart, Klaus Michael, Michael Scherer +1 more |
1995-06-13 |
| 5318928 |
Method for the surface passivation of sensors using an in situ sputter cleaning step prior to passivation film deposition |
Rainer Gegenwart, Helmut Stoll, Norbert Weimer, Hans-Dieter Wurczinger |
1994-06-07 |
| 5237152 |
Apparatus for thin-coating processes for treating substrates of great surface area |
Rainer Gegenwart, Roland Gesche, Karl-Heinz Kretschmer, Sonja Noll |
1993-08-17 |
| 5224202 |
Apparatus for the evaporation of liquids |
Manfred Arnold, Rainer Gegenwart, Sonja Noll, Helmut Stoll |
1993-06-29 |
| 5144196 |
Particle source, especially for reactive ionic etching and plasma-supported CVD processes |
Rainer Gegenwart |
1992-09-01 |
| 5069930 |
Method for the evaporation of monomers that are liquid at room temperature |
Ingo Hussla |
1991-12-03 |
| 4947789 |
Apparatus for vaporizing monomers that flow at room temperature |
Ingo Hussla |
1990-08-14 |