Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6210859 | Copolymer for the manufacture of chemical amplified photoresist and a positive photoresist composition using the same | Hyun Jeon, Joo-Hyeon Park, Jong Bum Lee | 2001-04-03 |
| 6146810 | Resist polymer and chemical amplified resist composition containing the same | Dong-Chul Seo, Sun-Yi Park, Joo-Hyeon Park | 2000-11-14 |
| 6111143 | Sulfonium salt and its manufacturing method | Joo-Hyeon Park, Dong-Chul Seo, Sun-Yi Park | 2000-08-29 |
| 5989775 | Copolymer useful for positive photoresist and chemical amplification positive photoresist composition comprising the same | Joo-Hyeon Park, Ji-Hong Kim, Ki Dae KIM, Sun-Yi Park | 1999-11-23 |
| 5962185 | Polymer for positive photoresist and chemical amplified positive photoresist composition containing the same | Joo-Hyeon Park, Ji-Hong Kim, Ki Dae KIM | 1999-10-05 |
| 5962186 | Polymer for chemical amplified positive photoresist composition containing the same | Joo-Hyeon Park, Ji-Hong Kim, Ki Dae KIM | 1999-10-05 |
| 5916995 | Acetal-substituted aromatic hydroxy compounds and negative photoresist compositions comprising the same | Joo-Hyeon Park, Ji-Hong Kim, Sun-Yi Park | 1999-06-29 |
| 5882835 | Positive photoresist resin and chemical amplified positive photoresist composition containing the same | Joo-Hyeon Park, Ki Dae KIM, Sun-Yi Park | 1999-03-16 |
| 5851728 | Three-component chemical amplified photoresist composition | Joo-Hyeon Park, Ki Dae KIM, Dong-Chui Seo | 1998-12-22 |
| 5723258 | Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same | Ji-Hong Kim, Sun-Yi Park, Joo-Hyeon Park | 1998-03-03 |
| 5677103 | Positive photoresist composition | Joo-Hyeon Park, Ji-Hong Kim, Sun-Yi Park | 1997-10-14 |
| 5667931 | Positive photoresist composition containing quinone diazide 5-triazine esterification compound | Dae-Youp Lee, Ki Dae KIM, Ji-Hong Kim | 1997-09-16 |
| 5665841 | Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same | Ji-Hong Kim, Sun-Yi Park, Joo-Hyeon Park | 1997-09-09 |
| 5523191 | Positive photoresist composition containing naphthoquinone diazide phosphazene esterification product | Ki Dae KIM, Hosull Lee, Dae-Youp Lee | 1996-06-04 |
| 5314978 | Copolymer of sulfur dioxide and nuclear-substituted trialkylgermylstyrene | Ji-Hong Kim, Seong Geun Jang, Dae-Youp Lee | 1994-05-24 |