Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10214610 | Polymer and composition containing same | Myong Woon Kim, Sang Ick Lee, Tae Seok BYUN, Seung Seob SON, Yong Hee KWONE +2 more | 2019-02-26 |
| 8318402 | Photosensitive compound and photosensitive composition including the same | Seok Chan Kang, Jung Hwan Cho, Kyung Chul Son | 2012-11-27 |
| 8158327 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition | Hyun-Sang Joo, Jung-Hoon Oh, Dae Hyeon Shin | 2012-04-17 |
| 8021826 | Copolymer and composition for organic and antireflective layer | Myung-Woong Kim, Young-Taek Lim, Hyung Gi Kim, Jun Ho Lee, Jong-Don Lee +1 more | 2011-09-20 |
| 7989257 | Polysilazane, method of synthesizing polysilazane, composition for manufacturing semiconductor device, and method of manufacturing semiconductor device using the composition | Yong Chang | 2011-08-02 |
| 7939245 | Light absorbent and organic antireflection coating composition containing the same | Ji-Young Kim, Jun Ho Lee | 2011-05-10 |
| 7326520 | Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same | Hyun-Sang Joo, Dong-Chul Seo, Young-Taek Lim, Seong-Duk Cho, Ji-Young Song +1 more | 2008-02-05 |
| 7291689 | Thermally stable low dielectric norbornene polymers with improved solubility and adhesion property | Jin Kyu Lee, Dong Woo Yoo, Seung-Jae Yang, Kook Heon Char | 2007-11-06 |
| 7285373 | Polymer and chemically amplified resist composition containing the same | Young-Taek Lim, Dong-Chul Seo, Chang Min Kim, Seong-Duk Cho, Hyun-Sang Joo | 2007-10-23 |
| 6987198 | Acid generator and thin film composition containing the same | Joung Bum Lee, Seong Ju Kim | 2006-01-17 |
| 6641974 | Chemically amplified resist composition containing low molecular weight additives | Jae Young Kim | 2003-11-04 |
| 6369143 | Polymer for radiation-sensitive resist and resist composition containing the same | Seong Ju Kim, Dong-Chul Seo, Sun-Yi Park | 2002-04-09 |
| 6358666 | Chemically amplified resist composition containing norbornane type low molecular additive | Dong-Chul Seo, Sun-Yi Park, Seong Ju Kim | 2002-03-19 |
| 6313327 | Carboxylic acid derivatives and their synthesis method | Dong Seoul Seo, Jae Young Kim, Seong Ju Kim | 2001-11-06 |
| 6268106 | Chemically amplified positive photoresist composition | Dong-Chul Seo, Sun-Yi Park, Seong Ju Kim | 2001-07-31 |
| 6210859 | Copolymer for the manufacture of chemical amplified photoresist and a positive photoresist composition using the same | Hyun Jeon, Seong Ju Kim, Jong Bum Lee | 2001-04-03 |
| 6146810 | Resist polymer and chemical amplified resist composition containing the same | Dong-Chul Seo, Sun-Yi Park, Seong Ju Kim | 2000-11-14 |
| 6111143 | Sulfonium salt and its manufacturing method | Dong-Chul Seo, Sun-Yi Park, Seong Ju Kim | 2000-08-29 |
| 5989775 | Copolymer useful for positive photoresist and chemical amplification positive photoresist composition comprising the same | Ji-Hong Kim, Ki Dae KIM, Sun-Yi Park, Seong Ju Kim | 1999-11-23 |
| 5962186 | Polymer for chemical amplified positive photoresist composition containing the same | Seong Ju Kim, Ji-Hong Kim, Ki Dae KIM | 1999-10-05 |
| 5962185 | Polymer for positive photoresist and chemical amplified positive photoresist composition containing the same | Seong Ju Kim, Ji-Hong Kim, Ki Dae KIM | 1999-10-05 |
| 5916995 | Acetal-substituted aromatic hydroxy compounds and negative photoresist compositions comprising the same | Seong Ju Kim, Ji-Hong Kim, Sun-Yi Park | 1999-06-29 |
| 5882835 | Positive photoresist resin and chemical amplified positive photoresist composition containing the same | Seong Ju Kim, Ki Dae KIM, Sun-Yi Park | 1999-03-16 |
| 5851728 | Three-component chemical amplified photoresist composition | Seong Ju Kim, Ki Dae KIM, Dong-Chui Seo | 1998-12-22 |
| 5723258 | Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same | Ji-Hong Kim, Sun-Yi Park, Seong Ju Kim | 1998-03-03 |