Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6369143 | Polymer for radiation-sensitive resist and resist composition containing the same | Joo-Hyeon Park, Seong Ju Kim, Dong-Chul Seo | 2002-04-09 |
| 6358666 | Chemically amplified resist composition containing norbornane type low molecular additive | Dong-Chul Seo, Joo-Hyeon Park, Seong Ju Kim | 2002-03-19 |
| 6268106 | Chemically amplified positive photoresist composition | Joo-Hyeon Park, Dong-Chul Seo, Seong Ju Kim | 2001-07-31 |
| 6146810 | Resist polymer and chemical amplified resist composition containing the same | Dong-Chul Seo, Joo-Hyeon Park, Seong Ju Kim | 2000-11-14 |
| 6111143 | Sulfonium salt and its manufacturing method | Joo-Hyeon Park, Dong-Chul Seo, Seong Ju Kim | 2000-08-29 |
| 5989775 | Copolymer useful for positive photoresist and chemical amplification positive photoresist composition comprising the same | Joo-Hyeon Park, Ji-Hong Kim, Ki Dae KIM, Seong Ju Kim | 1999-11-23 |
| 5916995 | Acetal-substituted aromatic hydroxy compounds and negative photoresist compositions comprising the same | Joo-Hyeon Park, Seong Ju Kim, Ji-Hong Kim | 1999-06-29 |
| 5882835 | Positive photoresist resin and chemical amplified positive photoresist composition containing the same | Joo-Hyeon Park, Seong Ju Kim, Ki Dae KIM | 1999-03-16 |
| 5723258 | Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same | Ji-Hong Kim, Seong Ju Kim, Joo-Hyeon Park | 1998-03-03 |
| 5677103 | Positive photoresist composition | Seong Ju Kim, Joo-Hyeon Park, Ji-Hong Kim | 1997-10-14 |
| 5665841 | Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same | Ji-Hong Kim, Seong Ju Kim, Joo-Hyeon Park | 1997-09-09 |