Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9321875 | Additive for resist and resist composition comprising same | Jin Bong Shin, Hyun Soon Lim, Joon Hee Han | 2016-04-26 |
| 8865919 | Sulfonium compound, photo-acid generator, and method for manufacturing the same | Hyun-Sang Joo, Dae Kyung Yoon, Dae Hyeon Shin | 2014-10-21 |
| 8765358 | Water-soluble resin composition and method of forming fine patterns by using the same | Sang Wook Park, So-Jung Park | 2014-07-01 |
| 8617789 | Photoacid generator, method for producing the same, and resist composition comprising the same | Jung-Hoon Oh, Jin Bong Shin, Tae Gon Kim | 2013-12-31 |
| 7326520 | Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same | Hyun-Sang Joo, Joo-Hyeon Park, Young-Taek Lim, Seong-Duk Cho, Ji-Young Song +1 more | 2008-02-05 |
| 7285373 | Polymer and chemically amplified resist composition containing the same | Young-Taek Lim, Joo-Hyeon Park, Chang Min Kim, Seong-Duk Cho, Hyun-Sang Joo | 2007-10-23 |
| 6369143 | Polymer for radiation-sensitive resist and resist composition containing the same | Joo-Hyeon Park, Seong Ju Kim, Sun-Yi Park | 2002-04-09 |
| 6358666 | Chemically amplified resist composition containing norbornane type low molecular additive | Sun-Yi Park, Joo-Hyeon Park, Seong Ju Kim | 2002-03-19 |
| 6268106 | Chemically amplified positive photoresist composition | Joo-Hyeon Park, Sun-Yi Park, Seong Ju Kim | 2001-07-31 |
| 6146810 | Resist polymer and chemical amplified resist composition containing the same | Sun-Yi Park, Joo-Hyeon Park, Seong Ju Kim | 2000-11-14 |
| 6111143 | Sulfonium salt and its manufacturing method | Joo-Hyeon Park, Sun-Yi Park, Seong Ju Kim | 2000-08-29 |