Issued Patents All Time
Showing 1–25 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10929177 | Managing resources for multiple trial distributed processing tasks | — | 2021-02-23 |
| 10810339 | Determination of dimensional changes of features across mask pattern simulation fields | — | 2020-10-20 |
| 8717539 | Calibration of optical line shortening measurements | — | 2014-05-06 |
| 7842439 | Calibration of optical line shortening measurements | — | 2010-11-30 |
| 7790480 | Method for determining relative swing curve amplitude | — | 2010-09-07 |
| 7709166 | Measuring the effect of flare on line width | Pierre Leroux | 2010-05-04 |
| 7556900 | Measuring the effect of flare on line width | Pierre Leroux | 2009-07-07 |
| 7541121 | Calibration of optical line shortening measurements | — | 2009-06-02 |
| 7537939 | System and method for characterizing lithography effects on a wafer | Steven Cheng Qian | 2009-05-26 |
| 7492465 | Method for determining optimal resist thickness | — | 2009-02-17 |
| 7099018 | Measurement of optical properties of radiation sensitive materials | — | 2006-08-29 |
| 7096127 | Measuring flare in semiconductor lithography | Ralf Ziebold, Frank E. Goodwin | 2006-08-22 |
| 7054007 | Calibration wafer for a stepper | Pierre Leroux | 2006-05-30 |
| 6800403 | Techniques to characterize iso-dense effects for microdevice manufacture | Pierre Leroux | 2004-10-05 |
| 6716649 | Method for improving substrate alignment | — | 2004-04-06 |
| 6613589 | Method for improving substrate alignment | — | 2003-09-02 |
| 6591155 | Methods and apparatus for calculating alignment of layers during semiconductor processing | — | 2003-07-08 |
| 6590219 | Apparatus and method for forming photoresist pattern with target critical dimension | — | 2003-07-08 |
| 6566016 | Apparatus and method for compensating critical dimension deviations across photomask | — | 2003-05-20 |
| 6544859 | Semiconductor processing methods and structures for determining alignment during semiconductor wafer processing | Edward Dension, Pierre Leroux | 2003-04-08 |
| 6498640 | Method to measure alignment using latent image grating structures | — | 2002-12-24 |
| 6465322 | Semiconductor processing methods and structures for determining alignment during semiconductor wafer processing | Edward V. Denison, Pierre Leroux | 2002-10-15 |
| 6372658 | Reducing contamination induced scumming, for semiconductor device, by ashing | Christopher Robinett, Ramiro Solis | 2002-04-16 |
| 6327513 | Methods and apparatus for calculating alignment of layers during semiconductor processing | — | 2001-12-04 |
| 6309804 | Reducing contamination induced scumming, for semiconductor device, by acid treatment | Christopher Robinett | 2001-10-30 |