Issued Patents All Time
Showing 26–45 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6301008 | Arrangement and method for calibrating optical line shortening measurements | Pierre Leroux | 2001-10-09 |
| 6287972 | System and method for residue entrapment utilizing a polish and sacrificial fill for semiconductor fabrication | Hunter B. Brugge | 2001-09-11 |
| 6068955 | Methods of inspecting for mask-defined, feature dimensional conformity between multiple masks | — | 2000-05-30 |
| 6063127 | Method for adaptive sampling for building accurate computer models | — | 2000-05-16 |
| 5982496 | Thin film thickness and optimal focus measuring using reflectivity | — | 1999-11-09 |
| 5976741 | Methods for determining illumination exposure dosage | Pierre Leroux | 1999-11-02 |
| 5968690 | Thin film thickness and optimal focus measuring using reflectivity | — | 1999-10-19 |
| 5962173 | Method for measuring the effectiveness of optical proximity corrections | Pierre Leroux, Sethi Satyendra | 1999-10-05 |
| 5902703 | Method for measuring dimensional anomalies in photolithographed integrated circuits using overlay metrology, and masks therefor | Pierre Leroux, Sethi Satyendra | 1999-05-11 |
| 5830610 | Method for measuring alignment accuracy in a step and repeat system utilizing different intervals | Pierre Leroux | 1998-11-03 |
| 5780208 | Method and mask design to minimize reflective notching effects | Pierre Leroux | 1998-07-14 |
| 5762688 | Particle removal wafer | Pierre Leroux | 1998-06-09 |
| 5607800 | Method and arrangement for characterizing micro-size patterns | — | 1997-03-04 |
| 5472562 | Method of etching silicon nitride | — | 1995-12-05 |
| 5310457 | Method of integrated circuit fabrication including selective etching of silicon and silicon compounds | — | 1994-05-10 |
| 5272118 | Photolithographic masking process | — | 1993-12-21 |
| 5205867 | Spin coating apparatus having a horizontally linearly movable wafer holder | — | 1993-04-27 |
| 5126289 | Semiconductor lithography methods using an ARC of organic material | — | 1992-06-30 |
| 5032492 | Photolithographic masking process and apparatus | — | 1991-07-16 |
| 4814243 | Thermal processing of photoresist materials | — | 1989-03-21 |