Issued Patents All Time
Showing 26–35 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7193294 | Semiconductor substrate comprising a support substrate which comprises a gettering site | Reiko Yoshimura, Koji Izunome, Kazuhiko Kashima | 2007-03-20 |
| 6340552 | Photosensitive composition containing a dissolution inhibitor and an acid releasing compound | Naoko Kihara, Fumihiko Yuasa, Tohru Ushirogouchi, Osamu Sasaki, Takuya Naito +1 more | 2002-01-22 |
| 6306553 | Photosensitive composition and method of forming a pattern using the same | Naoko Kihara, Fumihiko Yuasa, Tohru Ushirogouchi, Osamu Sasaki, Takuya Naito +1 more | 2001-10-23 |
| 5372914 | Pattern forming method | Takuya Naito, Osamu Sasaki, Naoko Kihara, Toru Ushirogouchi, Satoshi Saito +2 more | 1994-12-13 |
| 5348838 | Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group | Toru Ushirogouchi, Naoko Kihara, Osamu Sasaki, Takuya Naito, Satoshi Saito | 1994-09-20 |
| 5332648 | Potosensitive composition and method of forming a pattern using the same | Naoko Kihara, Fumihiko Yuasa, Tohru Ushirogouchi, Osamu Sasaki, Takuya Naito +1 more | 1994-07-26 |
| 5169740 | Positive type and negative type ionization irradiation sensitive and/or deep U.V. sensitive resists comprising a halogenated resin binder | Toru Ushirogouchi, Akitoshi Kumagae | 1992-12-08 |
| 4454222 | Process for forming resist patterns using mixed ketone developers | Akira Miura | 1984-06-12 |
| 4268607 | Method of patterning a resist layer for manufacture of a semiconductor element | — | 1981-05-19 |
| 4259407 | Radiation-sensitive positive resist | Yuzo Shimazaki, Masanobu Kohda, Hirohisa Kato, Hideo Saeki | 1981-03-31 |