Issued Patents All Time
Showing 26–33 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6291129 | Monomer, high molecular compound and photosensitive composition | Naomi Shida, Toru Ushirogouchi, Koji Asakawa, Shuji Hayase, Yoshihiko Nakano +1 more | 2001-09-18 |
| 6280897 | Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts | Koji Asakawa, Naoko Kihara, Naomi Shida, Toru Ushirogouchi, Makoto Nakase +2 more | 2001-08-28 |
| 6228552 | Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material | Koji Asakawa, Naomi Shida, Toru Ushirogouchi, Makoto Nakase | 2001-05-08 |
| 6071670 | Transparent resin, photosensitive composition, and method of forming a pattern | Toru Ushirogouchi, Naomi Shida, Makoto Nakase, Yoshiaki Kawamonzen, Rumiko Hayase +1 more | 2000-06-06 |
| 6045968 | Photosensitive composition | Toru Ushirogouchi, Koji Asakawa, Makoto Nakase, Naomi Shida | 2000-04-04 |
| 5962581 | Silicone polymer composition, method of forming a pattern and method of forming an insulating film | Shuzi Hayase, Yoshihiko Nakano, Rikako Kani, Mao Ito, Satoshi Mikoshiba +1 more | 1999-10-05 |
| 5932391 | Resist for alkali development | Toru Ushirogouchi, Koji Asakawa, Naoko Kihara, Makoto Nakase, Naomi Shida | 1999-08-03 |
| 5837419 | Photosensitive composition | Toru Ushirogouchi, Koji Asakawa, Makoto Nakase, Naomi Shida | 1998-11-17 |